We design and manufacture next generation chemical mechanical polishing (CMP) pads for the semiconductor and electronics industry.
To offer the best performance and value in polish pads and give our customers the competitive edge.
Because we use superior raw materials, and combine beneficial properties found in softer and harder pads, our pads deliver the best possible results in topography and defect reduction.
We have established a track record with our customers who have taken our pads through rigorous evaluation and testing. Using our pads these customers are increasing their productivity while reducing overall cost of ownership in their manufacturing processes.